Study on Synchrotron Radiation Lithography at BSRF

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PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130.
PENG Liang-Qiang, YI Fu-Ting, HAN Yong and ZHANG Ju-Fang. Study on Synchrotron Radiation Lithography at BSRF[J]. Chinese Physics C, 2001, 25(S1): 128-130. shu
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Received: 1900-01-01
Revised: 1900-01-01
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Study on Synchrotron Radiation Lithography at BSRF

    Corresponding author: PENG Liang-Qiang,
  • Institute of High Energy Physics,CAS,Beijing 100039,China

Abstract: It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography.A successive exposure method with present masks is put forward in this paper.Microstructures with thickness 2.2mm have been obtained by this method.A serial of studies of the effects on aspect ratio of mask,PMMA resist,substrate,wavelength range and dose of X rays have been processed.Microstructures with aspect ratio 104 have been obtained under optimized condition.

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