Design of magnet and control of the beam emittance for Penning H ion source

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OUYANG Hua-Fu and ZHANG Hua-Shun. Design of magnet and control of the beam emittance for Penning H ion source[J]. Chinese Physics C, 2008, 32(8): 668-672. doi: 10.1088/1674-1137/32/8/017
OUYANG Hua-Fu and ZHANG Hua-Shun. Design of magnet and control of the beam emittance for Penning H ion source[J]. Chinese Physics C, 2008, 32(8): 668-672.  doi: 10.1088/1674-1137/32/8/017 shu
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Received: 2007-10-08
Revised: 2007-10-17
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Design of magnet and control of the beam emittance for Penning H ion source

    Corresponding author: OUYANG Hua-Fu,

Abstract: 

The design requirement and principle of the deflection magnet for Magnetron and Penning H ion source are discussed. It is proved that there exists a maximum emittance for the beam that may be transformed by the magnet into a state with equal Twiss parameters of αry and βry, which is the requisite condition to get a minimum emittance at the entrance of RFQ after transporting by a LEBT with solenoids. For this maximum emittance, the corresponding magnetic field gradient index is 1.

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