Study on shunt impedance and voltage distribution of 4-rod RFQ cavity

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ZHANG Zhou-Li, ZHAO Hong-Wei, XU Zhe, ZHANG Sheng-Hu, ZHANG Cong, SUN Lie-Peng, MEI Li-Rong and SHEN Xiao-Kang. Study on shunt impedance and voltage distribution of 4-rod RFQ cavity[J]. Chinese Physics C, 2010, 34(3): 398-401. doi: 10.1088/1674-1137/34/3/018
ZHANG Zhou-Li, ZHAO Hong-Wei, XU Zhe, ZHANG Sheng-Hu, ZHANG Cong, SUN Lie-Peng, MEI Li-Rong and SHEN Xiao-Kang. Study on shunt impedance and voltage distribution of 4-rod RFQ cavity[J]. Chinese Physics C, 2010, 34(3): 398-401.  doi: 10.1088/1674-1137/34/3/018 shu
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Received: 2009-04-03
Revised: 2009-05-20
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Study on shunt impedance and voltage distribution of 4-rod RFQ cavity

    Corresponding author: ZHANG Zhou-Li,

Abstract: 

A high current RFQ (radio frequency quadrupole) is being studied at the Institute of Modern Physics, CAS for the direct plasma injection scheme. Shunt impedance is an important parameter when designing a 4-rod RFQ cavity, it reflects the RF efficiency of the cavity, and has a direct influence on the cost of the structure. Voltage distribution of a RFQ cavity has an effect on beam transmission, and particles would be lost if the actual voltage distribution is not as what it should be. The influence of cell length, stem thickness and height on shunt impedance and voltage distribution have been studied, in particular the effect of projecting electrodes has been investigated in detail.

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