Slow highly charged ion O4+ induced electron emission from clean solid surfaces

Get Citation
XU Zhong-Feng, ZHAO Yong-Tao, WANG Yu-Yu, ZHAO Di, WANG Jian-Guo, LI De-Hui, Qayyum Abdul, LI Fu-Li and XIAO Guo-Qing. Slow highly charged ion O4+ induced electron emission from clean solid surfaces[J]. Chinese Physics C, 2008, 32(S2): 247-250.
XU Zhong-Feng, ZHAO Yong-Tao, WANG Yu-Yu, ZHAO Di, WANG Jian-Guo, LI De-Hui, Qayyum Abdul, LI Fu-Li and XIAO Guo-Qing. Slow highly charged ion O4+ induced electron emission from clean solid surfaces[J]. Chinese Physics C, 2008, 32(S2): 247-250. shu
Milestone
Received: 2008-07-17
Revised: 1900-01-01
Article Metric

Article Views(3264)
PDF Downloads(589)
Cited by(0)
Policy on re-use
To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.
通讯作者: 陈斌, bchen63@163.com
  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

  1. 本站搜索
  2. 百度学术搜索
  3. 万方数据库搜索
  4. CNKI搜索

Email This Article

Title:
Email:

Slow highly charged ion O4+ induced electron emission from clean solid surfaces

    Corresponding author: XU Zhong-Feng,

Abstract: The total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+ with different material surfaces (W, Au, Si and SiO2) have been measured. It is found that the electron emission yield γ increases proportionally with the projectile velocity v ranging from 5.36×105m/s to 10.7× 105m/s. The total emission yield is dependent on the target materials, and it turns out to follow the relationship γ(Au)>γ(Si)>γ(W). The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant, which is in good agreement with the former studies.

    HTML

Reference (1)

目录

/

DownLoad:  Full-Size Img  PowerPoint
Return
Return