Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

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TAN Wei-Shi, YOU Biao, ZHANG Jie-Qiu, WU Xiao-Shan, HU An, JIANG Shu-Sheng, WANG Jun, JIA Quan-Jie, ZHANG Wen-Li and JIANG Xiao-Ming. Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak[J]. Chinese Physics C, 2001, 25(S1): 106-109.
TAN Wei-Shi, YOU Biao, ZHANG Jie-Qiu, WU Xiao-Shan, HU An, JIANG Shu-Sheng, WANG Jun, JIA Quan-Jie, ZHANG Wen-Li and JIANG Xiao-Ming. Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak[J]. Chinese Physics C, 2001, 25(S1): 106-109. shu
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Received: 1900-01-01
Revised: 1900-01-01
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Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

    Corresponding author: TAN Wei-Shi,
  • National Laboratory of Solid State Microstructures,Department of Physics,Nanjing 210093,China2 Institute of High Energy Physics,CAS,Beijing 100039,China

Abstract: The first and second antiferromagnetic oscillation peaks with respect to the spacer thichness of Cu in Co/Cu multilayers are determined.With the combination of the first and second oscillation peaks,[Co(2 nm)/Cu(t1)/Co(2 nm)/Cu(t2)]30 multilayer is fabricated and characterized.In contrast to the first and second oscillation peak samples ([Co(2 nm)/Cu(t1)]30)and ([Co(2 nm)/Cu(t2)]30),the enhancement of magnetoresistance(MR) in this combinated multilayer is observed.We believe that the enhancement of MR in the combinated sample is due to the added coupling between Co(2 nm)/Cu(t1)and Co(2 nm)/Cu(t2).

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