Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers

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WEI Xiang-Jun, XU Qing, JIA Quan-Jie and WANG Huan-Hua. Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers[J]. Chinese Physics C, 2005, 29(S1): 40-42.
WEI Xiang-Jun, XU Qing, JIA Quan-Jie and WANG Huan-Hua. Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers[J]. Chinese Physics C, 2005, 29(S1): 40-42. shu
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Received: 2005-10-28
Revised: 1900-01-01
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Phase Depth Profile in NiTi Shape Memory Alloy Films Made up from Sputter-Deposited Ni/Ti Multilayers

    Corresponding author: WEI Xiang-Jun,
  • Institute of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China2 Institute of High Energy Physics,CAS,Beijing 100049,China

Abstract: Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films.

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