Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

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HUANG Qiu-Shi, LI Hao-Chuan, SONG Zhu-Qing, ZHU Jing-Tao, WANG Zhan-Shan, LI Ai-Guo, YAN Shuai, MAO Cheng-Wen, WANG Hua, YAN Fen, ZHANG Ling, YU Xiao-Han, LIU Peng and LI Ming. Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens[J]. Chinese Physics C, 2013, 37(2): 028002. doi: 10.1088/1674-1137/37/2/028002
HUANG Qiu-Shi, LI Hao-Chuan, SONG Zhu-Qing, ZHU Jing-Tao, WANG Zhan-Shan, LI Ai-Guo, YAN Shuai, MAO Cheng-Wen, WANG Hua, YAN Fen, ZHANG Ling, YU Xiao-Han, LIU Peng and LI Ming. Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens[J]. Chinese Physics C, 2013, 37(2): 028002.  doi: 10.1088/1674-1137/37/2/028002 shu
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Received: 2012-03-20
Revised: 2012-05-08
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Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

    Corresponding author: ZHU Jing-Tao,

Abstract: The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μ. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.

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