Molybdenum sputtering film characterization for high gradient accelerating structures

B. Spataro; A. Marcelli; S. Sarti; V. A. Dolgashev; S. Tantawi; A. D. Yeremian; M. G. Grimaldi; L. Romano; F. Ruffino; R. Parodi; G. Cibin; C. Marrelli; M. Migliorati; C. Caliendo0

doi:10.1088/1674-1137/37/9/097005

Chinese Physics C> 2013, Vol. 37> Issue(9) : 097005 DOI: 10.1088/1674-1137/37/9/097005

Molybdenum sputtering film characterization for high gradient accelerating structures

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Abstract：
Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress. In this contribution we describe chemical composition, deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering. The deposited films are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value. Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering, XANES and photoemission spectroscopy. We will also consider multiple cells standing wave section coated by a molybdenum layer designed to improve the performance of X-Band accelerating systems.

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B. Spataro, A. Marcelli, S. Sarti, V. A. Dolgashev, S. Tantawi, A. D. Yeremian, M. G. Grimaldi, L. Romano, F. Ruffino, R. Parodi, G. Cibin, C. Marrelli, M. Migliorati and C. Caliendo0. Molybdenum sputtering film characterization for high gradient accelerating structures[J]. Chinese Physics C, 2013, 37(9): 097005. doi: 10.1088/1674-1137/37/9/097005

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Received: 2012-10-28
Revised: 2013-03-12

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通讯作者: 陈斌, bchen63@163.com

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沈阳化工大学材料科学与工程学院沈阳 110142

Molybdenum sputtering film characterization for high gradient accelerating structures

Received Date: 2012-10-28

Accepted Date: 2013-03-12

Available Online: 2013-09-05

Abstract: Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress. In this contribution we describe chemical composition, deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering. The deposited films are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value. Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering, XANES and photoemission spectroscopy. We will also consider multiple cells standing wave section coated by a molybdenum layer designed to improve the performance of X-Band accelerating systems.

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Molybdenum sputtering film characterization for high gradient accelerating structures

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